Multiscale modeling of anisotropic wet chemical etching of crystalline silicon

Author: Gosálvez M. A.   Foster A. S.   Nieminen R. M.  

Publisher: Edp Sciences

E-ISSN: 1286-4854|60|3|467-473

ISSN: 0295-5075

Source: EPL (EUROPHYSICS LETTERS), Vol.60, Iss.3, 2010-03, pp. : 467-473

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract