Atomic layer deposition of polycrystalline HfO 2 films by the HfI 4 -O 2 precursor combination

By Sundqvist J.   Harsta A.   Aarik J.   Kukli K.   Aidla A.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 147-151

Elsevier

Access to resources Recommend Favorite

HfO 2 films with high laser damage threshold

By Alvisi M.   Di Giulio M.   Marrone S.G.   Perrone M.R.   Protopapa M.L.   Valentini A.   Vasanelli L.  

Thin Solid Films, Vol. 358, Iss. 1, 2000-01 ,pp. : 250-258

Elsevier

Access to resources Recommend Favorite

Characterisation of HfO 2 deposited by photo-induced chemical vapour deposition

By Fang Q.   Zhang J.-Y.   Wang Z.M.   Wu J.X.   O'Sullivan B.J.   Hurley P.K.   Leedham T.L.   Davies H.   Audier M.A.   Jimenez C.   Senateur J.-P.   Boyd I.W.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 391-396

Elsevier

Access to resources Recommend Favorite

Broad excitation of Er luminescence in Er-doped HfO₂ films

By Wang J.   Shi Z.   Shi Y.   Pu L.   Pan L.   Zhang R.   Zheng Y.   Tao Z.   Lu F.  

Applied Physics A, Vol. 94, Iss. 2, 2009-02 ,pp. : 399-403

Springer Publishing Company

Access to resources Recommend Favorite

The n-type Gd-doped HfO₂ to silicon heterojunction diode

By Ketsman I.   Losovyj Y.B.   Sokolov A.   Tang J.   Wang Z.   Belashchenko K.D.   Dowben P.A.  

Applied Physics A, Vol. 89, Iss. 2, 2007-11 ,pp. : 489-492

Springer Publishing Company

Access to resources Recommend Favorite