Structural and electrical properties of chemical solution deposited (Bi 0.9 Tb 0.1 )(Fe 0.975 TM 0.025 )O 3±δ ( TM = Ni, Mn and Ti) thin films

Author： Raghavan C.  

Publisher： Springer Publishing Company

ISSN： 0928-0707

Source： Journal of Sol-Gel Science and Technology, Vol.66, Iss.1, 2013-04, pp. : 168-174

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