Author： Jiang Jing Li Shibin Jiang Yadong Wu Zhiming Xiao Zhanfei Su Yuanjie
Publisher： Taylor & Francis Ltd
ISSN： 1478-6443
Source： Philosophical Magazine, Vol.92, Iss.34, 2012-12, pp. : 4291-4299
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Abstract
Two-tier structured silicon with micron/nanometre scale features is fabricated by simple wet chemical etching. The structured silicon sample exhibits dramatically enhanced absorption from ultraviolet to near-infrared wavelength (250-2500 nm). Absorption is enhanced to near unity at wavelengths shorter than 1100 nm caused by the extremely suppressed reflection from the two-tier structured surface. Within the wavelength range from 1100 to 2500 nm, the sample exhibits a strong absorbance of 69.6% at 1100 nm and an average of 30% at longer wavelengths. By analyzing XPS spectra from the surface of the two-tier structured sample, we attribute this near-infrared absorption to band structure and morphological changes presented in the textured layer.
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