AFM and Raman studies of topological insulator materials subject to argon plasma etching

Author: Childres Isaac   Tian Jifa   Miotkowski Ireneusz   Chen Yong  

Publisher: Taylor & Francis Ltd

ISSN: 1478-6443

Source: Philosophical Magazine, Vol.93, Iss.6, 2013-02, pp. : 681-689

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Abstract