

Author: Deresmes D. Marissael V. Stievenard D. Ortega C.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.255, Iss.1, 1995-01, pp. : 258-261
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content


Electrical behaviour of fresh and stored porous silicon films
By Ciurea M.L. Baltog I. Lazar M. Iancu V. Lazanu S. Pentia E.
Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. :


Transport in crystalline silicon-porous silicon junctions
Philosophical Magazine B, Vol. 77, Iss. 1, 1998-01 ,pp. :


Deep ''cold'' junctions by porous silicon impregnation
By Amato G. Boarino L. Brunetto N. Turnaturi M.
Thin Solid Films, Vol. 297, Iss. 1, 1997-04 ,pp. :


Post-treatment effects on electrical conduction in porous silicon
By Moller F. Chorin M.B. Koch F.
Thin Solid Films, Vol. 255, Iss. 1, 1995-01 ,pp. :


Electrical contact to porous silicon by electrodeposition of iron
By Ronkel F. Schultze J.W. Arens-Fischer R.
Thin Solid Films, Vol. 276, Iss. 1, 1996-04 ,pp. :