A novel capacitor technology based on porous silicon

Author： Lehmann V.   Honlein W.   Reisinger H.   Spitzer A.   Wendt H.   Willer J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.276, Iss.1, 1996-04, pp. : 138-142

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