Ar/H 2 sputtering deposition of 350 m thick Si:H/SiO 2-x :H multilayers having flat interfaces for optical applications

Author： Takahashi H. Nagata H. Kataoka H.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.277, Iss.1, 1996-05, pp. : 132-137

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