Microstructure and physical properties of iron carbide films formed by plasma enhanced chemical vapor deposition

Author： Siriwardane H.   Pringle O.A.   Newkirk J.W.   James W.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.287, Iss.1, 1996-10, pp. : 8-15

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique

By Zhang H.   Xu Z.  

Thin Solid Films, Vol. 446, Iss. 1, 2004-01 ,pp. : 99-105

Elsevier

Access to resources Recommend Favorite

Free carrier optical absorption used to analyze the electrical properties of polycrystalline silicon films formed by plasma enhanced chemical vapor deposition

By Watanabe T.   Sameshima T.   Nakahata K.   Kamiya T.   Shimizu I.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 248-250

Elsevier

Access to resources Recommend Favorite

Preferred orientations and microstructure of MgO films prepared by plasma-enhanced metalorganic chemical vapor deposition

By Fujii E.   Tomozawa A.   Torii H.   Takayama R.   Nagaki M.   Narusawa T.  

Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. : 85-90

Elsevier

Access to resources Recommend Favorite

A Comparison of Diamond-Like Carbon Films Properties Obtained by Plasma Enhanced Chemical Vapor Deposition and Electro-Deposition

By  

Materials Science Forum, Vol. 2016, Iss. 852, 2016-05 ,pp. : 1029-1033

Trans Tech Publications

Access to resources Recommend Favorite

Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition

By Baik H.K.   Kim J.H.   Kim Y.H.   Choi D.J.  

Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 79-83

Elsevier

Access to resources Recommend Favorite