Monitoring the deposition of Cu thin film using the double exposure holographic interferometry technique

Author: Dongre M.B.   Fulari V.J.   Kulkarni H.R.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.301, Iss.1, 1997-06, pp. : 62-64

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Abstract