Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition

Author: Chen L.C.   Chen K.H.   Chen C.K.   Bhusari D.M.   Yang C.Y.   Lin M.C.   Huang Y.F.   Chuang T.J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.303, Iss.1, 1997-07, pp. : 66-75

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Abstract