Power dependence of gate oxide damage from electron shading effect in high-density-plasma metal etching

Author: Hashimoto K.   Shimpuku F.   Hasegawa A.   Hikosaka Y.   Nakamura M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.316, Iss.1, 1998-03, pp. : 1-5

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract