Microwave plasma chemical vapor deposition of diamond films with low residual stress on large area porous silicon substrates

Author： Khan M.A.   Haque M.S.   Naseem H.A.   Brown W.D.   Malshe A.P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.332, Iss.1, 1998-11, pp. : 93-97

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