Author: Wang T. Wang H. Xu P. Zhao X. Liu Y. Chao S.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.334, Iss.1, 1998-12, pp. : 103-108
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Effect of water dose on the atomic layer deposition rate of oxide thin films
By Matero R. Rahtu A. Ritala M. Leskela M. Sajavaara T.
Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. :
Electrochromic properties of nanocrystalline tungsten oxide thin films
By Ashrit P.V. Bader G. Truong V.-V.
Thin Solid Films, Vol. 320, Iss. 2, 1998-05 ,pp. :
Effects of Annealing on the Properties of Copper Oxide Thin Films
Materials Science Forum, Vol. 2015, Iss. 819, 2015-07 ,pp. :