Charge migration on hydrophobic and hydrophilic silicon dioxide

Author: Hedborg E.   Winquist F.   Sundgren H.   Lundstrom I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.340, Iss.1, 1999-02, pp. : 250-256

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract