Author: Wang J. Lu X. Wen S. Li H. Wang L.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.342, Iss.1, 1999-03, pp. : 291-296
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Tokarev A. Bondarenko G. Heuchel M. Yampolskii Yu.
Russian Chemical Bulletin, Vol. 58, Iss. 8, 2009-08 ,pp. :
A Cat-CVD Si 3 N 4 film study and its application to the ULSI process
By Uchiyama Y. Masuda A. Matsumura H.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :