Author: Li G.H. Yang L. Jin Y.X. Zhang L.D.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.368, Iss.1, 2000-06, pp. : 164-167
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Thin film TiO 2 photocatalyst deposited by reactive magnetron sputtering
By Yamagishi M. Kuriki S. Song P.K. Shigesato Y.
Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. :
Hydrophilic characteristics of rf-sputtered amorphous TiO 2 film
By Nakamura M. Aoki T. Hatanaka Y.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :