Preparation of (Ti 1-x Al x )N films from mixed alkoxide solutions by plasma CVD

Author: Shimada S.   Yoshimatsu M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.370, Iss.1, 2000-07, pp. : 146-150

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract