The effect of oxygen-to-argon ratio on the electrical and reliability characteristics of sputtered Sr 0.8 Bi 2.5 Ta 1.2 Nb 0.9 O 9+x thin films

Author： Tsai M.S. Tseng T.Y.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.372, Iss.1, 2000-09, pp. : 190-199

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