Hole transport due to shallow acceptors along boron doped SiGe quantum wells

Author: Altukhov I.V.   Kagan M.S.   Sinis V.P.   Thomas S.G.   Wang K.L.   Blom A.   Odnoblyudov M.O.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.380, Iss.1, 2000-12, pp. : 218-220

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Abstract