Ta-O phonon peaks in tantalum oxide films on Si

Author： Ono H.   Hosokawa Y.   Shinoda K.   Koyanagi K.   Yamaguchi H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.381, Iss.1, 2001-01, pp. : 57-61

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Properties of thin Ta-N films reactively sputtered on Cu/SiO 2 /Si substrates

By Chuang J.-C.   Chen M.-C.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 213-217

Elsevier

Access to resources Recommend Favorite

Structures of tantalum pentoxide thin films formed by reactive sputtering of Ta metal

By Chang P.-H.   Liu H.-Y.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 56-63

Elsevier

Access to resources Recommend Favorite

Ion-beam sputtering of (Ta 2 O 5 ) x -(SiO 2 ) 1-x composite thin films

By Cevro M.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 91-103

Elsevier

Access to resources Recommend Favorite

Deposition of Ta 2 O 5 /SiO 2 multilayer films by a new process ''injection MOCVD''

By Felten F.   Senateur J.P.   Labeau M.   Yu-Zhang K.   Abrutis A.  

Thin Solid Films, Vol. 296, Iss. 1, 1997-03 ,pp. : 79-81

Elsevier

Access to resources Recommend Favorite

Residual stress and thermal expansion behavior of TaO x N y films by the micro-cantilever method

By Jong C.-A.   Chin T.-S.   Fang W.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 291-297

Elsevier

Access to resources Recommend Favorite