Fabrication of heterostructure p- -Fe 0.95 Mn 0.05 Si 2 /n-Si diodes by Fe + and Mn + co-implantation in Si(100) substrates

Author： Katsumata H.   Makita Y.   Takada T.   Tanoue H.   Kobayashi N.   Hasegawa M.   Kakemoto H.   Tsukamoto T.   Uekusa S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.381, Iss.2, 2001-01, pp. : 244-250

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