The etching characteristics of SrBi 2 Ta 2 O 9 thin film in CF 4 /Ar plasma using magnetically enhanced inductively coupled plasma

Author: Kim D.-P.   Kim C.-I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 162-166

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Abstract