High rate deposition of TiO 2 by DC sputtering of the TiO 2-X target

Author: Ohsaki H.   Tachibana Y.   Mitsui A.   Kamiyama T.   Hayashi Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.392, Iss.2, 2001-07, pp. : 169-173

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Abstract