Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol

Author： Miller K.A.   John C.   Zhang K.Z.   Nicholson K.T.   McFeely F.R.   Banaszak Holl M.M.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.397, Iss.1, 2001-10, pp. : 78-82

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