Author： Fabreguette F. Guillot J. Cardoso L.P. Marcon R. Imhoff L. Marco de Lucas M.C. Sibillot P. Bourgeois S. Dufour P. Sacilotti M.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.400, Iss.1, 2001-12, pp. : 125-129
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Andrade Gamboa J. Bohe A.E. Pasquevich D.M.
Thermochimica Acta, Vol. 334, Iss. 1, 1999-08 ,pp. :
Access to resources
Recommend
XRD and AES characterization of TiO x N y thin films grown by ion assisted deposition
By Martev I.N.
Vacuum, Vol. 67, Iss. 2, 2002-09 ,pp. :
Morphological characterization of TiO 2 thin films
By Viseu T.M.R. Ferreira M.I.C.
Vacuum, Vol. 52, Iss. 1, 1999-01 ,pp. :