Density functional study on the adsorption and surface reactions on SiO 2 in TiN-CVD using TiCl 4 and NH 3

Author： Tanaka T.   Nakajima T.   Yamashita K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.409, Iss.1, 2002-04, pp. : 51-57

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