Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition

Author： Tsai D.-S. Chang T.-C. Hsin W.-C. Hamamura H. Shimogaki Y.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.411, Iss.2, 2002-05, pp. : 177-184

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Graphite formation on Ni film by chemical vapor deposition

By Yudasaka M. Kikuchi R. Matsui T. Ohki Y. Baxendale M. Yoshimura S. Ota E.

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 117-123

Elsevier

Access to resources Recommend Favorite

A kinetic model for photochemical vapor deposition from germane and silane

By Tao M.

Thin Solid Films, Vol. 307, Iss. 1, 1997-10 ,pp. : 71-78

Elsevier

Access to resources Recommend Favorite

Chemical vapor deposition of copper film from hexafluoroacetyl-acetonateCu (I) vinylcyclohexane

By Choi K.-K. Rhee S.-W.

Thin Solid Films, Vol. 397, Iss. 1, 2001-10 ,pp. : 70-77

Elsevier

Access to resources Recommend Favorite

Magnetoresistant La 1-x Sr x MnO 3 films by pulsed injection metal organic chemical vapor deposition: effect of deposition conditions, substrate material and film thickness

By Abrutis A. Plausinaitiene V. Kubilius V. Teiserskis A. Saltyte Z. Butkute R. Senateur J.P.

Thin Solid Films, Vol. 413, Iss. 1, 2002-06 ,pp. : 32-40

Elsevier

Access to resources Recommend Favorite

Control of silicon particle behavior using a low frequency electromagnetic field in silane plasma chemical vapor deposition

By Yang S.-C. Fujiyama H.

Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 59-62

Elsevier

Access to resources Recommend Favorite