Characterization of porous silicate for ultra-low k dielectric application

Author: Liu P.-t.   Chang T.C.   Hsu K.C.   Tseng T.Y.   Chen L.M.   Wang C.J.   Sze S.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.414, Iss.1, 2002-07, pp. : 1-6

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Abstract