Characterisation of r.f. sputtered tungsten disulfide and oxysulfide thin films

Author： Martin-Litas I. Vinatier P. Levasseur A. Dupin J.C. Gonbeau D. Weill F.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.416, Iss.1, 2002-09, pp. : 1-9

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Characterisation of r.f. sputtered Fe-Cr-oxide films

By Stenberg T. Keranen J. Vuoristo P. Mantyla T. Virtanen S. Schmuki P. Buchler M. Bohni H.

Vacuum, Vol. 52, Iss. 4, 1999-04 ,pp. : 477-483

Elsevier

Access to resources Recommend Favorite

Properties of palladium silicide thin films obtained by vacuum rapid thermal annealing of r.f. sputtered Pd films on Si

By Beshkov G. Dimitrov D.B. Koprinarova J. Gesheva K.

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 177-180

Elsevier

Access to resources Recommend Favorite

Hydration of r.f. magnetron sputtered MgO thin films for a protective layer in AC plasma display panel

By Lee J.H. Eun J.H. Park S.Y. Kim S.G. Kim H.J.

Thin Solid Films, Vol. 435, Iss. 1, 2003-07 ,pp. : 95-101

Elsevier

Access to resources Recommend Favorite

Crystallization behavior of r.f.-sputtered TiNi thin films

By Chen J.Z. Wu S.K.

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 194-199

Elsevier

Access to resources Recommend Favorite

Nanostructural characterisation of SnO 2 thin films prepared by reactive r.f. magnetron sputtering of tin

By Gubbins M.A. Casey V. Newcomb S.B.

Thin Solid Films, Vol. 405, Iss. 1, 2002-02 ,pp. : 270-275

Elsevier

Access to resources Recommend Favorite