Oxidation process in pulsed laser ablation of Si with various ambients

Author: Masuda A.   Usui S.   Yamanaka Y.   Yonezawa Y.   Minamikawa  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.416, Iss.1, 2002-09, pp. : 106-113

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Abstract