Study of the interface in n + c-Si/p-type c-Si heterojunctions: role of the fluorine chemistry in the interface passivation

Author： Losurdo M.   Grimaldi A.   Sacchetti A.   Capezzuto P.   Ambrico M.   Bruno G.   Roca F.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 171-175

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