Investigation of TiO 2 -doped HfO 2 thin films deposited by photo-CVD

Author： Fang Q.   Zhang J.-Y.   Wang Z.M.   Wu J.X.   O'Sullivan B.J.   Hurley P.K.   Leedham T.L.   Davies H.   Audier M.A.   Jimenez C.   Senateur J.-P.   Boyd I.W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.428, Iss.1, 2003-03, pp. : 263-268

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