A tracking ellipsometer of picometer sensitivity enabling 0.1% sputtering-rate monitoring of EUV nanometer multilayer fabrication

Author: Yamamoto M.   Hotta Y.   Sato M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 224-229

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Abstract