Author: Matsuda Y. Koyama Y. Tashiro K. Fujiyama H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 154-160
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Quantitative modeling of reactive sputtering process for MgO thin film deposition
By Matsuda Y. Otomo K. Fujiyama H.
Thin Solid Films, Vol. 390, Iss. 1, 2001-06 ,pp. :
Thin Solid Films, Vol. 266, Iss. 2, 1995-10 ,pp. :
The mechanism of TiO 2 deposition by direct current magnetron reactive sputtering
By Barnes M.C. Gerson A.R. Kumar S. Hwang N.-M.
Thin Solid Films, Vol. 446, Iss. 1, 2004-01 ,pp. :