Author： Strauss G.N. Pulker H.K.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.442, Iss.1, 2003-10, pp. : 66-73
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Adhesion behavior of PVD coatings on ECR plasma and ion beam treated polymer films
By Milde F. Goedicke K. Fahland M.
Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. :
Access to resources
Recommend
Ion implantation for plasma torches
By Jankov I.R. Goldman I.D. Szente R.N.
Vacuum, Vol. 65, Iss. 3, 2002-05 ,pp. :
Fundamentals of plasma and sputtering processes
By Kinbara A. Kusano E. Kondo I.
Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. :
Modeling plasma processes in microelectronics
By Richards D.F. Bloomfield M.O. Soukane S. Cale T.S.
Vacuum, Vol. 59, Iss. 1, 2000-10 ,pp. :