Directional and preferential sputtering-based physical vapor deposition

By Rossnagel S.M.  

Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. : 1-12

Elsevier

Access to resources Recommend Favorite

Preferential sputtering and surface binding energy in metal silicides

By Zaporozchenko V.I.   Vojtusik S.S.   Stepanova M.G.  

Vacuum, Vol. 47, Iss. 5, 1996-05 ,pp. : 421-424

Elsevier

Access to resources Recommend Favorite

Control of preferential orientation of AlN films prepared by the reactive sputtering method

By Ishihara M.   Li S.J.   Yumoto H.   Akashi K.   Ide Y.  

Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. : 152-157

Elsevier

Access to resources Recommend Favorite

Optical emission spectroscopy of the sputtering process in the triode system

By Axelevitch Alexander   Apter Boris  

Radiation Effects and Defects in Solids, Vol. 169, Iss. 9, 2014-09 ,pp. : 759-766

Taylor & Francis Ltd

Access to resources Recommend Favorite

Optical emission spectroscopy of self-sustained magnetron sputtering

By Posadowski W.M.   Brudnik A.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 11-15

Elsevier

Access to resources Recommend Favorite