Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

By Sasabayashi T.   Ito N.   Nishimura E.   Kon M.   Song P.K.   Utsumi K.   Kaijo A.   Shigesato Y.  

Thin Solid Films, Vol. 445, Iss. 2, 2003-12 ,pp. : 219-223

Elsevier

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Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering

By Szyszka B.  

Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. : 164-169

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Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

By McClure J.C.   Joshi R.N.   Singh V.P.  

Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. : 32-35

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Characterization of transparent and conductive electrodes of indium tin oxide thin films by sequential reactive evaporation

By Penza M.   Cozzi S.   Tagliente M.A.   Mirenghi L.   Martucci C.   Quirini A.  

Thin Solid Films, Vol. 349, Iss. 1, 1999-07 ,pp. : 71-77

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Characterization of indium-doped zinc oxide films deposited by pyrolytic spray with different indium compounds as dopants

By Zironi E.P.   Canetas-Ortega J.   Gomez H.   Maldonado A.   Asomoza R.   Palacios-Gomez J.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 117-123

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