Magnetron plasma structure with strong magnetic field

By Shidoji E.   Makabe T.  

Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. : 27-31

Elsevier

Access to resources Recommend Favorite

SiO 2 etching characteristics in DC magnetron plasmas by using an external magnetic field

By Yamada H.   Kuwahara K.   Fujiyama H.  

Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. : 6-12

Elsevier

Access to resources Recommend Favorite

The relation between the plasma characteristic and the corrosion properties of TiN/Ti multilayers deposited by unbalanced magnetron sputtering

By Flores M.   Muhl S.   Andrade E.  

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 217-223

Elsevier

Access to resources Recommend Favorite

Design, plasma studies, and ion assisted thin film growth in an unbalanced dual target magnetron sputtering system with a solenoid coil

By Engstrom C.   Berlind T.   Birch J.   Hultman L.   Ivanov I.P.   Kirkpatrick S.R.   Rohde S.  

Vacuum, Vol. 56, Iss. 2, 2000-02 ,pp. : 107-113

Elsevier

Access to resources Recommend Favorite

The influence of substrate temperature on the properties of Al, Zr and W coatings deposited by closed-field unbalanced magnetron sputtering

By Kelly P.J.   Arnell R.D.  

Vacuum, Vol. 49, Iss. 1, 1998-01 ,pp. : 43-47

Elsevier

Access to resources Recommend Favorite