TiO 2-X sputter for high rate deposition of TiO 2

Author: Tachibana Y.   Ohsaki H.   Hayashi A.   Mitsui A.   Hayashi Y.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.59, Iss.2, 2000-11, pp. : 836-843

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Abstract