Author: Ramos H.J. Awayan R.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.65, Iss.3, 2002-05, pp. : 397-402
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Liu B. Jiang B.Y. Fu Y. Cheng D.J. Wu X.F. Yang S.Z.
Thin Solid Films, Vol. 349, Iss. 1, 1999-07 ,pp. :
Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia
Vacuum, Vol. 71, Iss. 4, 2003-07 ,pp. :
Production of OH free radical using sheet plasma with vertical gas-flow
By Matsumoto M. Shibagaki M. Tonegawa A. Takayama K.
Vacuum, Vol. 47, Iss. 6, 1996-06 ,pp. :