Increase of Si solution rate into Al matrix by repeated irradiation of intense pulsed ion beam

Author： Akamatsu H. Tanaka H. Yamanishi T. Egawa S. Yamasaki T. Miki M. Yatsuzuka M.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.65, Iss.3, 2002-05, pp. : 563-569

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