Effects of the surface treatment of silicon substrate on the field emission characteristic of a silicon and amorphous diamond cold cathode emitter

Author： Chen J. Chen J. Deng S. She J. Xu N.

Publisher： Elsevier

ISSN： 0304-3991

Source： Ultramicroscopy, Vol.79, Iss.1, 1999-09, pp. : 89-93

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