An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions

Author: Bailes M.   Bohm S.   Peter L.M.   Riley D.J.   Greef R.  

Publisher: Elsevier

ISSN: 0013-4686

Source: Electrochimica Acta, Vol.43, Iss.12, 1998-05, pp. : 1757-1772

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Abstract