Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)

Author: Djenizian T.   Petite B.   Santinacci L.   Schmuki P.  

Publisher: Elsevier

ISSN: 0013-4686

Source: Electrochimica Acta, Vol.47, Iss.6, 2001-12, pp. : 891-897

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