Nickel electroless deposition process on chemically pretreated Si(100) wafers in aqueous alkaline solution

Author: Niwa D.   Takano N.   Yamada T.   Osaka T.  

Publisher: Elsevier

ISSN: 0013-4686

Source: Electrochimica Acta, Vol.48, Iss.9, 2003-04, pp. : 1295-1300

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Abstract