A novel water developable photoresist for deep UV lithography

Author： Kim J.-B.   Jung M.-H.   Chang K.-H.  

Publisher： Elsevier

ISSN： 0014-3057

Source： European Polymer Journal, Vol.33, Iss.8, 1997-08, pp. : 1239-1243

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Modification and Fabrication of the Stamp for Large Area UV-Nanoimprint Lithography

By  

Nanotechnology Research Journal, Vol. , Iss. , 2014-07 ,pp. : 97-106

Nova Science Publishers, Inc.

Access to resources Recommend Favorite

Effect of Ammonia Addition on Photo-Resist Removal Characteristics by Ozone/Water Vapor Treatments

By Noda Seiji   Horibe Hideo   Kawase Kazumasa   Miyamoto Makoto   Kuzumoto Masaki   Kataoka Tatsuo  

Journal of Advanced Oxidation Technologies, Vol. 6, Iss. 2, 2003-07 ,pp. : 132-142

Science and Technology Network Inc.

Access to resources Recommend Favorite

The Effect of UV and Combined Chlorine/UV Treatment on Coliphages in Drinking Water Disinfection

By Zyara Alyaa M.   Torvinen Eila   Veijalainen Anna-Maria   Heinonen-Tanski Helvi  

Water, Vol. 8, Iss. 4, 2016-04 ,pp. : 130-130

MDPI

Access to resources Recommend Favorite

Effect of Cultural Conditions on Deep UV Resonance Raman Spectra of Bacteria

By Manoharan R.   Ghiamati E.   Chadha S.   Nelson W. H.   Sperry J. F.  

Applied Spectroscopy, Vol. 47, Iss. 12, 1993-12 ,pp. : 2145-2150

Society for Applied Spectroscopy

Access to resources Recommend Favorite

High-Throughput, High-Resolution Echelle Deep-UV Raman Spectrometer

By Bykov Sergei V.   Sharma Bhavya   Asher Sanford A.  

Applied Spectroscopy, Vol. 67, Iss. 8, 2013-08 ,pp. : 873-883

Society for Applied Spectroscopy

Access to resources Recommend Favorite