Influence of the Lead Source Materials on the Microstructure and Ferroelectric Properties of PZT Films Sputter-Deposited Using Lead and Lead Oxide

Author： Chang W.

Publisher： Springer Publishing Company

ISSN： 1385-3449

Source： Journal of Electroceramics, Vol.13, Iss.1-3, 2004-07, pp. : 35-39

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Abstract

In this investigation, PZT films were sputter-deposited on Si/SiO₂/Ti/Pt substrates using a dual-target system. The dual targets Pb/PZT(PbZr_0.54Ti_0.46O₃) and PbO/PZT(PbZr_0.54Ti_0.46O₃) were used to reveal the effects of various lead compensation source materials on the microstructure and ferroelectric properties of the films. The structures of the films were characterized by X-ray diffractometry (XRD) and field emission scanning electron microscopy (FESEM). The chemical binding state was determined using X-ray photoelectron spectrometry (XPS). Ferroelectric polarizability was measured using a Radiant Technology RT66A tester. The influence of deposition temperatures on the microstructure and ferroelectric properties of the films was studied. Perovskite PZT films were successfully deposited using the Pb/PZT and the PbO/PZT dual target sputtering systems at a substrate temperature of between 500 and 580∘C. Structural change was elucidated as a function of deposition temperatures and the lead sources were correlated with the ferroelectric properties of the film. The ferroelectric characteristics of the PZT films deposited using the PbO/PZT dual target were better than those of films deposited using the Pb/PZT dual target, because the former films had a higher bonding energy.