Electrical properties of Ga 2 O 3 -based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)

Author： Liu G. Shan F. Park J. Lee W. Lee G. Kim I. Shin B. Yoon S.

Publisher： Springer Publishing Company

ISSN： 1385-3449

Source： Journal of Electroceramics, Vol.17, Iss.2-4, 2006-12, pp. : 145-149

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