Enhanced diffusion and improved device performance using dual spectral source rapid thermal processing

Author: Singh R.   Cherukuri K.   Vedula L.   Rohatgi A.   Mejia J.   Narayanan S.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.12, 1997-12, pp. : 1422-1427

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